25 mm x 36 mm Plate Beamsplitters
- Ideal for Reflected Light Microscopy
- Designed for Microscopy Filter Cubes
- Multiple Wavelength Ranges and Beamsplitting Ratios Available
BSW10R
50:50 for 400 - 700 nm
BSW23R
50:50 for 0.9 - 2.6 μm
BSX12R
10:90 for 1.2 - 1.6 μm
BSW11R Mounted in a
CM1-DCH Cage Cube
Please Wait
Click to Enlarge
Diagram of reflected light microscopy. Cross-polarized linear polarizers are typically used in addition to prevent discarded light from reaching the image plane.
Quick Links | |||||
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Wavelength | Splitting Ratio | ||||
250 - 450 nm | 50:50 | ||||
350 - 1100 nm | 50:50 | ||||
400 - 700 nm | 10:90 | 30:70 | 50:50 | 70:30 | 90:10 |
600 - 1700 nm | 50:50 | ||||
700 - 1100 nm | 10:90 | 30:70 | 50:50 | 70:30 | 90:10 |
0.9 - 2.6 μm | 50:50 | ||||
1.0 - 6.0 µm | 50:50 | ||||
1.2 - 1.6 μm | 10:90 | 30:70 | 50:50 | 70:30 | 90:10 |
Click to Enlarge
Item number is engraved on beamsplitting surface, when available.
Features
- 25 mm x 36 mm Rectangular Plate Beamsplitters Designed for our Microscopy Filter Cubes
- Available for Multiple Wavelength Ranges Between 250 nm and 6.0 µm
- Certain Wavelength Ranges Offer Multiple Split Ratios (R:T) for AOI = 45°
- 1 mm Thick Substrates
When performing reflected light microscopy, a beamsplitter directs light from an illumination source to a sample while simultaneously transmitting the light reflected by the sample onto the image plane. Thorlabs offers Non-Polarizing Plate Beamsplitters at varying wavelengths and beam splitting ratios for ultravoilet (UV), visible, near infrared (NIR), and mid-infrared (MIR) applications.
These rectangular beamsplitters, measuring 25 mm x 36 mm x 1 mm, have a dielectric beamsplitter coating deposited on the front surface. The beamsplitter dimensions match our dichroic mirrors commonly used in microscopy, making them compatible with our microscopy filter cubes and other rectangular filter holders. Thorlabs also offers a complete selection of non-polarizing plate beamsplitters in round diameters and for additional wavelength ranges.
The majority of these beamsplitters are fabricated using a UV fused silica or an IR fused silica substrate, both of which offer superior homogeneity and a lower coefficient of thermal expansion than N-BK7 glass. In addition, UV fused silica exhibits high transmission deep into the UV with virtually no laser-induced fluorescence, making it an ideal choice for applications from the UV to the near IR. For performance in the MIR, our 1.0 - 6.0 µm beamsplitter is made from Calcium Fluoride.
To reduce the effect of ghost images, an antireflection (AR) coating, which is designed for the same operating wavelength range as the beamsplitter coating on the front surface, has been deposited onto the back surface of a selection of our beamsplitter. By applying an AR coating to the back side of the beamsplitter, the percentage of light reflected back through the front surface is reduced to an average of less than 1% over the entire operating range of the coating. To differentiate between the front and back surfaces, the beamsplitter surface is indicated with the Item # engraving, as shown in the image above.
Mounting Options
For customers who wish to use these beamsplitters in microscopy applications, Thorlabs manufactures a family of filter cubes and mounts. Additionally, these beamsplitters can be mounted in the KM2536 kinematic mount, which is designed to secure 25 mm x 36 mm rectangular optics with minimal stress.
Schematic of light passing through a beamsplitter. Blue arrows indicate light emitted from the light source and red arrows indicate light reflected from the sample.
Beamsplitter Effect on Light Through a Microscope | |||||
---|---|---|---|---|---|
Nominal Split Ratio (Reflected:Transmitted) | 10:90 | 30:70 | 50:50 | 70:30 | 90:10 |
Light Reflected onto Sample Planea | 10% | 30% | 50% | 70% | 90% |
Light Transmitted onto Image Planea | 9% | 21% | 25% | 21% | 9% |
Beamsplitting Inside a Microscope
A beamsplitter splits an incident beam into two: a reflected beam and a transmitted beam. The split ratio states what portion of the beam gets reflected versus transmitted (reflected:transmitted). In a microscope, the beamsplitter is used in two fashions: to reflect incident light from the light source to the sample plane, and to transmit light from the sample to the imaging plane. To perform this task, the beamsplitter is installed at a 45° angle to both beams (see image to the right). In addition to the beamsplitter, two linear polarizers at orthogonal polarizations are typically used to reduce noise from discarded light (see diagram in Overview tab). Depending upon your imaging requirements, a different beamsplitting ratio than 50:50 may be desirable.
To provide a firmer grasp of beamsplitter functionality inside a microscope, in the table above we give a back of the envelope calculation of the percentage of input light that is directed toward the sample plane and light that is directed towards the imaging plane for different split ratios. This nominal split ratio calculation should only be used as a guideline when choosing between beamsplitters, as it assumes perfect reflections and does not include losses such as transmission loss, reflectivity of the sample, or loss from polarizing elements. Split ratios also vary with incident wavelength, so please check the reflectance and transmission data at the desired wavelength.
Posted Comments: | |
Yanan Ge
 (posted 2023-11-20 11:26:48.887) Can you cut it to a certain size? If possible, how long will the delivery time be? ksosnowski
 (posted 2023-12-04 06:01:56.0) Hello, thank you for contacting Thorlabs. Custom products can be requested by emailing techsales@thorlabs.com or by using the red "Request Quote" button above. We will discuss the possibility of offering this customization directly. Kimi Huang
 (posted 2022-04-08 16:03:55.33) What is the Parallelism of BSW26R two surface? cdolbashian
 (posted 2022-04-13 11:25:01.0) Thank you for reaching out to us Kimi. The parallelism for the surfaces of the BSW26R is specced at <3 arcmin. Simon Yang
 (posted 2021-07-06 12:13:57.477) Hi :
We are interested in the product BSW26R,
there are some gaps in the specifications,
can you modify the gap
the BSW26R spec is 25 mm x 36 mm, t = 1 mm
What we need is Ø1" t = 1 mm
Simon YLohia
 (posted 2021-07-07 02:58:40.0) Hello, thank you for contacting Thorlabs. Custom products can be requested by emailing techsales@thorlabs.com or by using the red "Request Quote" button above. We will discuss the possibility of offering this customization directly. user
 (posted 2021-03-28 03:34:27.36) Hi, I would like to combine two beams with a 50/50 beamsplitter because no dichroic mirror would work. Can the incident light enter surface 2 (not the beamsplitting surface) first and how much light would be reflected in this case? Thank you YLohia
 (posted 2021-03-30 10:53:03.0) Hello, thank you for contacting Thorlabs. Yes, beamsplitters can be used for beam-combination applications. The reflectance will depend on the wavelength used. |
Item # | BSW20R | |
---|---|---|
Nominal Split Ratio (Reflected:Transmitted) | 50:50 | |
Coating on Surface 1a | 250 - 450 nm Beamsplitting Coating for 45° AOI |
|
Coating on Surface 2 | 250 - 450 nm Antireflection Coating (Ravg < 1%) |
|
Size (L x H) | 36.0 mm x 25.0 mm | |
Thickness | 1.0 mm | |
Dimensional Tolerance | ±0.1 mm | |
Substrate | UV Fused Silica | |
Clear Aperture | >22.5 mm x 32.4 mm | |
Surface Quality | 40-20 Scratch-Dig | |
Transmitted Wavefront Error | λ/4 @ 633 nm Over the Clear Aperture | |
Overall Performance | Unpolarized Light | Tabs = 50 ± 12%, Rabs = 50 ± 12%, Tabs + Rabs > 99% |
Polarization Relationship | |Ts-Tp| < 40%, and |Rs-Rp| < 40% | |
Transmission Plot | ||
Reflectance Plot | ||
Raw Transmission and Reflectance Data | Raw Data |
Item # | BSW26R | |
---|---|---|
Nominal Split Ratio (Reflected:Transmitted) |
50:50 | |
Coating on Surface 1a | 350 - 1100 nm Beamsplitting Coating for 45° AOI |
|
Coating on Surface 2 | 350 - 1100 nm Antireflection Coating (Ravg < 2%) |
|
Size (L x H) | 36.0 mm x 25.0 mm | |
Thickness | 1.0 mm | |
Dimensional Tolerance | ±0.1 mm | |
Substrate | UV Fused Silica | |
Clear Aperture | >22.5 mm x 32.4 mm | |
Surface Quality | 40-20 Scratch-Dig | |
Transmitted Wavefront Error | λ/2 @ 633 nm Over the Clear Aperture | |
Overall Performance |
Unpolarized Light | Tabs = 50 ± 12%, Rabs = 50 ± 12%, Tabs + Rabs > 99% |
Polarization Relationship | |Ts-Tp| < 40%, and |Rs-Rp| < 40% | |
Transmission Plot | ||
Reflectance Plot | ||
Raw Transmission and Reflectance Data |
Raw Data |
Item # | BSN10R | BSS10R | BSW10R | BST10R | BSX10R | |
---|---|---|---|---|---|---|
Nominal Split Ratio (Reflected:Transmitted) | 10:90 | 30:70 | 50:50 | 70:30 | 90:10 | |
Coating on Surface 1a | 400 - 700 nm Beamsplitting Coating for 45° AOI | |||||
Coating on Surface 2 |
400 - 700 nm Antireflection Coating (Ravg < 1%) | |||||
Size (L x H) | 36.0 mm x 25.0 mm | |||||
Thickness | 1.0 mm | |||||
Thickness Tolerance | ±0.1 mm | |||||
Substrate | Uv Fused Silica | |||||
Clear Aperture | >22.5 mm x 32.4 mm | |||||
Surface Quality | 40-20 Scratch-Dig | |||||
Transmitted Wavefront Error | λ/4 @ 633 nm | |||||
Overall Performance |
Unpolarized Light |
Tabs = 90 ± 8% Rabs = 10 ± 8% Tabs+Rabs > 99% |
Tabs = 70 ± 8% Rabs = 30 ± 8% Tabs+Rabs > 99% |
Tabs = 50 ± 8% Rabs = 50 ± 8% Tabs+Rabs > 99% |
Tabs = 30 ± 8% Rabs = 70 ± 8% Tabs+Rabs > 99% |
Tabs = 10 ± 8% Rabs = 90 ± 8% Tabs+Rabs > 99% |
Polarization Relationship |
|Ts - Tp| < 35% and |Rs - Rp| < 35% | |||||
Transmission Plot | ||||||
Reflectance Plot | ||||||
Raw Transmission and Reflectance Data | Raw Data | Raw Data | Raw Data | Raw Data | Raw Data |
Item # | BSW29R | |
---|---|---|
Nominal Split Ratio (Reflected:Transmitted) | 50:50 | |
Coating on Surface 1a | 600 - 1700 nm Beamsplitting Coating for 45° AOI |
|
Coating on Surface 2 | 600 - 1700 nm Antireflection Coating (Ravg < 1.5%) |
|
Size (L x H) | 36.0 mm x 25.0 mm | |
Thickness | 1.0 mm | |
Dimensional Tolerance | ±0.1 mm | |
Substrate | UV Fused Silica | |
Clear Aperture | >22.5 mm x 32.4 mm | |
Surface Quality | 40-20 Scratch-Dig | |
Transmitted Wavefront Error | λ/2 @ 633 nm Over the Clear Aperture | |
Overall Performance | Unpolarized Light | Tabs = 50 ± 10%, Rabs = 50 ± 10%, Tabs + Rabs > 99% |
Polarization Relationship | |Ts-Tp| < 40%, and |Rs-Rp| < 40% | |
Transmission Plot | ||
Reflectance Plot | ||
Raw Transmission and Reflectance Data | Raw Data |
Item # | BSN11R | BSS11R | BSW11R | BST11R | BSX11R | |
---|---|---|---|---|---|---|
Nominal Split Ratio (Reflected:Transmitted) | 10:90 | 30:70 | 50:50 | 70:30 | 90:10 | |
Coating on Surface 1a | 700 - 1100 nm Beamsplitting Coating for 45° AOI | |||||
Coating on Surface 2 | 700 - 1100 nm Antireflection Coating (Ravg < 1%) | |||||
Size (L x H) | 36.0 mm x 25.0 mm | |||||
Thickness | 1.0 mm | |||||
Thickness Tolerance | ±0.1 mm | |||||
Substrate | UV Fused Silica | |||||
Clear Aperture | >22.5 mm x 32.4 mm | |||||
Surface Quality | 40-20 Scratch-Dig | |||||
Transmitted Wavefront Error | λ/4 @ 633 nm | |||||
Overall Performance |
Unpolarized Light |
Tabs = 90 ± 8% Rabs = 10 ± 8% Tabs+Rabs > 99% |
Tabs = 70 ± 8% Rabs = 30 ± 8% Tabs+Rabs > 99% |
Tabs = 50 ± 8% Rabs = 50 ± 8% Tabs+Rabs > 99% |
Tabs = 30 ± 8% Rabs = 70 ± 8% Tabs+Rabs > 99% |
Tabs = 10 ± 8% Rabs = 90 ± 8% Tabs+Rabs > 99% |
Polarization Relationship |
|Ts - Tp| < 35% and |Rs - Rp| < 35% | |||||
Transmission Plot | ||||||
Reflectance Plot | ||||||
Raw Transmission and Reflectance Data | Raw Data | Raw Data | Raw Data | Raw Data | Raw Data |
Item # | BSW23R | |
---|---|---|
Nominal Split Ratio (Reflected:Transmitted) | 50:50 | |
Coating on Surface 1a | 0.9 - 2.6 μm Beamsplitting Coating for 45° AOI |
|
Coating on Surface 2 | 0.9 - 2.6 μm Antireflection Coating (Ravg < 1.5%) |
|
Size (L x H) | 36.0 mm x 25.0 mm | |
Thickness | 1.0 mm | |
Dimensional Tolerance | ±0.1 mm | |
Substrate | IR Fused Silica | |
Clear Aperture | >22.5 mm x 32.4 mm | |
Surface Quality | 40-20 Scratch-Dig | |
Transmitted Wavefront Error | λ/2 @ 633 nm Over the Clear Aperture | |
Overall Performance | Unpolarized Light | Tabs = 50 ± 10%, Rabs = 50 ± 10%, Tabs + Rabs > 99% |
Polarization Relationship | |Ts-Tp| < 40%, and |Rs-Rp| < 40% | |
Transmission Plot | ||
Reflectance Plot | ||
Raw Transmission and Reflectance Data | Raw Data |
Item # | BSW511R | |
---|---|---|
Nominal Split Ratio (Reflected:Transmitted) | 50:50 | |
Coating on Surface 1 | 1 - 6 μm Beamsplitting Coating for 45° AOI |
|
Coating on Surface 2 | None | |
Size (L x H) | 36.0 mm x 25.0 mm | |
Thickness | 1.0 mm | |
Thickness Tolerance | ±0.1 mm | |
Substrate | Calcium Fluoride | |
Clear Aperture | >22.5 mm x 32.4 mm | |
Surface Quality | 60-40 Scratch-Dig | |
Transmitted Wavefront Error | <λ/4 @ 633 nm Over the Clear Aperture | |
Overall Performance | Unpolarized Light | Tabs = 50 ± 20%, Rabs = 50 ± 20%, Tabs + Rabs > 95% |
Polarization Relationship | |Ts-Tp| < 35%, and |Rs-Rp| < 35% | |
Transmission Plot | ||
Reflectance Plot | ||
Raw Transmission and Reflectance Data | Raw Data |
Item # | BSN12R | BSS12R | BSW12R | BST12R | BSX12R | |
---|---|---|---|---|---|---|
Nominal Split Ratio (Reflected:Transmitted) | 10:90 | 30:70 | 50:50 | 70:30 | 90:10 | |
Coating on Surface 1a | 1.2 - 1.6 μm Beamsplitting Coating for 45° AOI | |||||
Coating on Surface 2 | 1.2 - 1.6 μm Antireflection Coating (Ravg < 1%) | |||||
Size (L x H) | 36.0 mm x 25.0 mm | |||||
Thickness | 1.0 mm | |||||
Thickness Tolerance | ±0.1 mm | |||||
Substrate | UV Fused Silica | |||||
Clear Aperture | >22.5 mm x 32.4 mm | |||||
Surface Quality | 40-20 Scratch-Dig | |||||
Transmitted Wavefront Error | λ/4 @ 633 nm | |||||
Overall Performance |
Unpolarized Light |
Tabs = 90 ± 8% Rabs = 10 ± 8% Tabs+Rabs > 99% |
Tabs = 70±8% Rabs = 30±8% Tabs+Rabs > 99% |
Tabs = 50 ± 8% Rabs = 50 ± 8% Tabs+Rabs > 99% |
Tabs = 30 ± 8% Rabs = 70 ± 8% Tabs+Rabs > 99% |
Tabs = 10 ± 8% Rabs = 90 ± 8% Tabs+Rabs > 99% |
Polarization Relationship |
|Ts - Tp| < 35% and |Rs - Rp| < 35% | |Ts - Tp| < 15% and |Rs - Rp| < 15% |
|Ts - Tp| < 35% and |Rs - Rp| < 35% | |||
Transmission Plot | ||||||
Reflectance Plot | ||||||
Raw Transmission and Reflectance Data | Raw Data | Raw Data | Raw Data | Raw Data | Raw Data |